抄録
Fe-B films sputtered in Ar+N2 plasma were investigated in order to obtain high initial permeabilities. It was important to be developed for the relations between initial permeability μi and film structure such as phase, grain size, and lattice strain. Fe- (1∼4 at%) B films sputtered in Ar+5%N2 plasma show high μi about 2000 annealed at 400°C and about 1000 at 500°C. Results of X-ray and electron diffraction pattern indicate that the films with high μi consists of α phase. By comparing this with the results for Fe-N films, it is suggested that high μi in Fe-B-N films is caused by the reduction of grain size and induced lattice deformation as well as other metallurgical structure such as the homogeneities.
