日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
窒化膜
Fe-Si-N薄膜の軟磁気特性
矢野 暢芳大沼 繁弘林出 光生松本 文夫藤森 啓安増本 健
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ジャーナル オープンアクセス

1991 年 15 巻 2 号 p. 357-360

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Crystal structure and magnetic properties of sputter-deposited Fe-Si-N films were investigated. Structure of Fe-Si-N films had single phase of a-Fe, but films with higher N content had two phases consisting of a-Fe and γ'-Fe4N. Coercivity (Hc) lower than 1 Oe was obtained in α-Fe single phase. Permeability (μ) was found to be strongly related to the substrate temperature (Tsub) during deposition. For example, the deposition at Tsub=230°C gave rise to μ=3600 at 10 MHz, while Tsub=room temp. resulted in μ< 100 at 10 MHz. These highμ were obtained in the films of α-Fe single phase, in which the microcrystalline with (111), plane orientation exised. Furthermore, high thermal stability of permeability was found to be obtained in the films with high Si concentration.
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© 1991 (社)日本応用磁気学会
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