Abstract
Manufacturing of the erasable audio disk is calling for cost effective and reliable processes. One of the critical steps during production is the deposition of dielectric thin films. Related reactive sputter techniques are difficult to handle and limit the productivity of coating systems. The present paper reports on results of a development work on a mid frequency powered reactive magnetron sputter process for fast and long term stable deposition of silicon nitride and other dielectric materials. Different magnetron designs are presented, and their integration into high throughput manufacturing equipment is shown.
© 1993 by The Magnetics Society of Japan
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