Abstract
The influences of Co-Cr-Pt-Ta sputtering-target microstructure on C/Co-Cr-Pt-Ta/Cr/glass films were investigated. The sputtering target consisted of a Co solid solution matrix and Ta- and Pt-rich precipitates. Annealing and rolling can increase the Pt and Ta content of the matrix. When the film is made by using an annealed and rolled target, its Hc and S* become large and the Hc distribution becomes small. These changes are related to the film composition. Simple calculations related to the ejection angular distribution of sputtered particles and yields suggest that about compositional changes in films are brought by the differences in the target microstructures.
