Journal of the Physical Society of Japan
Online ISSN : 1347-4073
Print ISSN : 0031-9015
ISSN-L : 0031-9015
Hot Electrons in Si(100) Inversion Layer at Low Lattice Temperatures
Yutaka ShinbaKoichi NakamuraMitsuru FukuchiMakoto Sakata
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1982 年 51 巻 1 号 p. 157-163

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The hot electron effect at low lattice temperatures 1≤T≤30 K is studied on the assumption that, in addition to the phonon scattering and some residual scattering independent of T, there is an unknown mechanism which limits the electron mobility such that μ−1(Te, T)=μRES−1ph−1(Te, T)+μ?−1(Te), where Te is the electron temperature. μ?−1(Te) is determined by requiring that μ−1(Te, T) reproduces the measured low field mobility. The field dependence of μ(Te, T) is deduced from the usual energy balance consideration and it is concluded that the dependence can provide a crucial test for the existence of μ?−1(Te) for it should be noticeably weaker if there were no such unknown mechanism.
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