JSAP Annual Meetings Extended Abstracts
Online ISSN : 2436-7613
The 64th JSAP Spring Meeting 2017
Session ID : 17a-313-3
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Fluorocarbon radical behavior of synchronized dc-imposed pulsed plasmas for advanced dielectric etching processes
*Toshinari UeyamaKeigo TakedaHiroki KondoKenji IshikawaMakoto SekineMasaru HoriManabu IwataYoshinobu Ohya
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© 2017 The Japan Society of Applied Physics
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