Benefits induced by droplets existing in high-temperature reaction field in mist CVD

Abstract

The development of a solution-based atmospheric pressure functional thin-film fabrication method has attracted attention from the viewpoint of energy conservation. In particular, mist chemical vapor deposition (CVD) can synthesize various thin films, including thin films that are difficult to synthesize using conventional methods. Researchers and research institutes using mist CVD are not limited to Japan but are deployed around the world. This research introduction describes mist CVD and discusses research on the state of mist droplets in a reactor. This report informs readers about one area where mist CVD can be used effectively, which can only be understood by understanding the principles of mist CVD and considering its characteristics.