TPDシートプラズマ源を用いたCNx膜の成膜と評価
2002 年 14 巻 1-2 号 p. 41-42
詳細
2002 年 14 巻 1-2 号 p. 41-42
The nitrogen gas reactive plasma is irradiated on the carbon target in order to obtain CNx films. The critera of a better irradiation process are as follows; the target voltage and the discharged current are 300V and 20A, respectively. The CNx films have been analyzed by the FTIR, XPS(ESCA), AFM, Raman and UV Methods. The results suggest that the CNx film is amorphous state.
