抄録
A supercritical fluid is a high-pressure medium that possesses unique features such as solvent ability and nano penetration capability. Using supercritical CO_2 fluids as a medium for thin film deposition provides excellent gap-filling and step-coverage possibilities. Lacking of the information of pros and cons and deposition characteristics exists due to the novelty of this technique. One of the reasons for that is no presence of deposition tools sophisticated as much as existing deposition techniques such as CVD. We have developed a flow-type deposition tool that enables continuous supply of a metal precursor with fixing the deposition parameters. This paper reports the development of a "full fluid"-type deposition processor that aids to carry out furthermore precise deposition experiments.
