A study on the tribochemical polishing of GaN substrate

抄録

In this study, tribochemical polishing of GaN substrate under the atmospheric condition was investigated. Four types of polishing plates, such as a sapphire, quartz glass, borosilicate glass and soda-lime glass were used to polish the GaN substrate. The material removal rate (MRR) and the microroughness of GaN substrate was evaluated by scanning white light interferometric microscopy and atomic force microscopy. As a result, we concluded that for improving the MRR and the microroughness of the GaN substrate in tribochemical polishing technique, soda-lime glass was the most suitable among all the selected materials of the polishing plates. Obtained results show that the surface roughness of GaN is markedly improved from 4.240 nm Rms to 0.391 nm Rms and the MRR is 1746 nm/h.