円筒内面スパッタコーティング用アルゴンプラズマの高密度化に関する基礎研究(OS9-2 表面設計とトライボロジー(II))

抄録

Plasma Enhanced coatings such as sputtering and PECVD (Plasma enhanced chemical vapor deposition) are widely used for improving the surface tribological properties of mechanical parts. However, the coating to a complex shape including the inner walls of a long narrow tube is much more difficult than that to a simple plane, because it is hard to generate the high-density and uniform plasma along the surfaces of such a complex shape. In this study, we developed a new microwave-enhanced sputtering source for the coating to the inner walls of a long narrow tube. The high density (>10^<11> cm^<-3>) plasma was ignited at an input power of no more than 28 W at a pressure of 0.1 mTorr.