Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
2015
Session ID : TuC-1-1
Conference information
TuC-1-1 OPTIMIZED ABERRATION COMPENSATION FOR DIGITAL HOLOGRAPHY USING DUAL MASK
Sungbin JeonDo-Hyung KimGeon LimNo-Cheol Park
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Abstract
We propose the optimization method for aberration compensation in digital holography using 2D Zernike fitting. Although the least square regression approach shows effective result, it requires heavy cost of performance. The proposed method applies additional random mask for selecting background specimen, so the calculation time could be reduced maintaining quality. To confirm the effectiveness both qualitative and quantitative analysis are conducted.
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© 2015 The Japan Society of Mechanical Engineers
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