タルボット効果を用いた3次元リソグラフィによる3次元ナノ構造形成法

～露光波面が加工形状に及ぼす影響～

抄録

Three-dimensional nanostructures are applied to optical devices for controlling optical wavefront. A method which is able to fabricate several kinds of structures simultaneously is required for manufacturing various optical devices. For meeting the requirements, we focus on a three-dimensional lithography process using the Talbot effect in combination with other interference phenomenon. In this report, two types of three-dimensional nanostructure are fabricated by using an exposure mask with grating and flat surface. For estimating geometry of the fabricated structure, a light intensity distribution with two different periodicities was calculated by the FDTD method. Experimental results show that the proposed method is able to fabricate both a periodical three-dimensional structure and periodical layers.