抄録
This paper reports on fabrication and characterization of atomic force microscopy (AFM) dual probe with narrow-gapped dual Si tip and dual cantilever with sputtered Fe_<60>Pd_<40> magneto-strictive film for switching of the cantilevers. A 600 nm-gapped dual Si tip was fabricated in a device layer of a silicon-on-insulator (SOI) wafer through self-align fabrication process based on narrow Si trench etching, refilling, polish-back, and Si crystalline anisotropic etching. After the dual Si tip fabrication. Fe_<60>Pd_<40> film (1μm)/ Si (2μm) dual cantilever was formed by MEMS fabrication process. The cantilevers were orthogonally located. By static magnetic flux of 300 Gauss along a cantilever, it was deflected to 1 μm by positive magneto-striction of the FePd film. In particular, the other cantilever orthogonal to the magnetic flax shows no deflection, resulting in sufficient individual actuation of the dual cantilever for switching.
