材料
Online ISSN : 1880-7488
Print ISSN : 0514-5163
ISSN-L : 0514-5163
RFプラズマCVD法によるDLC膜の生成とその摩擦・摩耗特性
出水 敬曽根 匠夏川 一輝藤島 征雄
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1993 年 42 巻 479 号 p. 997-1003

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Hard diamond-like-carbon (DLC) films were deposited on silicon substrate by RF plasma CVD using methane as a reactant gas. Both CH4 concentration and RF power were varied to find out a better deposition condition to make DLC film harder, since DLC film will be applied to tribological use. The deposition condition of CH4: 100% and RF power: 300W was the best in this paper. The deposition rate of DLC film under the condition was 2.1μm/hr.
Friction and wear experiments were conducted with a reciprocating friction and wear test apparatus. EDX and XPS were used to analyze the sliding surfaces. The DLC film deposited under the above condition was slid against several kinds of metals to investigate fundamental friction and wear properties. And the results were compared with those of silicon substrate and steel (S15C). DLC film coating extremely reduced friction and wear of silicon substrate slid against all metals used in this paper. DLC film showed very low friction and wear especially against Ti alloy (Ti-6Al-4V), pure Ti, and stainless steel (SUS304). These 3 kinds of metals have characteristic of causing seizure easily during sliding or machining. The above mentioned results suggest that DLC film will have good tribological performance against metals that have high adhesive characteistic.

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