数値制御EEM (Elastic Emission Machining) 加工システムの開発

抄録

Ultraprecise figuring systems are needed in many scientific fields. For example the mirrors for synchrotron-radiation X-ray facilities and extreme ultraviolet lithography systems should have atomically smoothed surfaces and extremely high figure accuracy of the order of nanometer range. Furthermore, next-generation semiconductor surfaces should be atomically flat as the substrates for nanometer devices. The EEM (Elastic Emission Machining) system developed by the authors can provide the atomically smoothed surfaces free from any crystallographic damage. A basic research has been performed to evaluate the use of a numerically controlled EEM system for ultraprecise figure corrections. We have constructed an EEM figuring system for ultraprecise scientific components. Testing showed that its performances are sufficient for figuring with nanometer accuracy.