抄録
TiO2 is one of the most important oxides in surface science and its surface/interface properties have been intensively studied in view of photochemistry and catalysis. Furthermore, TiO2 has attracted a growing attention from the viewpoint of electronics applications today. The state of the art of oxide epitaxy now enables us to design the nano-scale TiO2-based heterostructures. Development of atomically flat TiO2 (rutile) single crystal substrates is a key to a good reproducible growth of rutile thin films by the layer-by-layer method. The resultant high-quality of the films can meet very well with the requirements for the studies of well-defined surface/interface properties of TiO2. In the present review, we would like to report new physics and chemistry in TiO2-based epitaxial heterostructures whose composition and structure are atomically well controlled.
