表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:触媒CVD法による薄膜・プロセス技術
触媒CVD法によるカーボンナノウォール成長
伊藤 貴司
著者情報
ジャーナル フリー

2010 年 31 巻 4 号 p. 202-207

詳細
抄録

Carbon nanowall(CNW) is a carbon nanomaterial that has a wall structure consisting of graphite, which stands on a substrate. Owing to this structure, the CNW shows interesting characteristics such as a large surface area and a high aspect ratio. Therefore, CNW is expected to be used as capacitor electrodes and electron field emitters. Catalytic chemical vapor deposition(Cat-CVD) has advantages including the use of convenient and low-cost equipment and the high decomposition rate of the source gas. This method has been used in the deposition of diamond, silicon films and carbon nanotubes. We used this method for the deposition of CNWs. In this paper, I present the preparation of CNWs by Cat-CVD including discuss of the growth of CNWs.

著者関連情報

この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
前の記事 次の記事
feedback
Top