マイクロ・スパッタリングによるダイヤモンド薄膜の平坦化加工

抄録

We succeeded in planing the surfaces of diamond films, synthesized by microwave plasma CVD, by using penning discharge micro-sputtering. In this paper we observed the etched diamond film surface by SEM and measured the etching rates under the conditions of Ar and (Ar+O₂) gas sputterings with Au and Ti targets. Thus the planed surfaces of diamond films were obtained and new materials were deposited on the films with choosing adequate targets and gases. These experimental results suggest some new application.