アルゴンスパッタリングを用いた白雲母のXPS深さ方向分析
1998 年 19 巻 12 号 p. 826-830
詳細
1998 年 19 巻 12 号 p. 826-830
The depth profiles of natural mica were determined by XPS using Ar+ sputtering. The localities and the chemical states of the atoms were studied under proper analysis conditions. The Ar+ beam with an energy of 1 keV was used to make the sputter rate slow enough. A low take-off angle (20 degrees) was used to obtain a fine resolution of the depth profiles. As a result, the periodic variations in atomic concentration were observed at the peaks; O(1 s), Si(2 p), Mg (2 p), and K(2 p). The variations indicate periodic stacking of sheets; tetrahedral sheet, octahedral sheet, and interlayer cations. A periodic variation in the Al(2 p) binding energy in the range of 74.20 to 74.28eV was observed, and it suggests that the tetrahedral Al and the octahedral Al atoms existed alternately in the crystal structure along with an axis perpendicular to the surface.
