表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
真空紫外光プロセスの現状と将来
佐々木 亘
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ジャーナル フリー

1999 年 20 巻 6 号 p. 388-392

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Efficient and intense light sources in the vacuum-ultraviolet spectral region and their applications have been reviewed. High-intensity dielectric-barrier-discharge Ar, Kr and Xe excimer lamps were emphasized. Rare gas excimer lasers such as Ar2, Kr2 with electron beam excitations and discharge pumped F2 lasers were briefly mentioned as coherent VUV light sources. Potentialities of ArKr hetero-eximer lasers were also discussed. Applications of VUV light to surface cleanings, SiO2 thin films decompositions and compositions on Si wafers were reviewed.

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