抄録
A novel technique for precision microfabrication of hard materials such as fused quartz and SiC has been developed by using laser ablation with VUV-UV multiwavelength excitation. In this process, VUV laser beam of small laser fluence (several tens mJ/cm2) and UV laser beam of large laser fluence (several J/cm2) are directed to samples at the same time. The essential mechanism for insulators such as fused quartz is strong absorption of UV laser beams to the excited state formed by VUV laser beams (Excited-State Absorption: ESA). However, direct photo-ionization by the VUV laser beam is important for wide bandgap semiconductors such as SiC. Advantages of this process are discussed in comparison of the conventional single wavelength VUV laser ablation.
