表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
アルキルアンモニウムハライド分子の吸着したSiO2およびH/Si基板のζ電位
菅野 勉藤井 政俊
著者情報
ジャーナル フリー

1999 年 20 巻 7 号 p. 486-491

詳細
抄録

Adsorption of alkylammonium halide on both hydrophilic and hydrophobic surfaces were investigated by ζ potential and surface force measurements. Silicon oxide and hydrogen-terminated silicon plates were selected as hydrophilic and hydrophobic surfaces, respectively. ζ potentials of the planar surfaces were measured in aqueous solutions of hexadecyltrimethylammonium bromide (C16TAB) in the absence and presence of 1 mM KCl. The surface force measurement was carried out by AFM with silicon oxide or hydrogen-terminated silicon probes in aqueous solutions of C16TAB. Measurements of the two surfaces showed that the dependence of both ζ potential and surface force curve on the C16 TAB concentration were different, respectively. In a high concentration region, beyond critical micelle concentration, the occupied area per unit charge on the silicon oxide surface was 1.4 times larger than that on the hydrogen-terminated silicon surface. In this concentration region, the surface force of the silicon oxide was larger than that of the hydrogenterminated silicon.

著者関連情報
© 社団法人 日本表面科学会
前の記事 次の記事
feedback
Top