SIMSにおける画像処理
2次イオン質量分析法
1988 年 9 巻 1 号 p. 65-74
詳細
1988 年 9 巻 1 号 p. 65-74
The application of digital image processing to SIMS data has not yet to realized its full potential. Quantitative mapping of the element distribution on the sub-micron scale with high sensitivity is performed only by using SIMS.
However, in order to utilize SIMS practically, many problems such as ion matrix effects, topographical effect, nonuniform sputter removal of matrix layers and implanted primary ions which might cause chemical effects, should be solved.
This report is to discuss the problems involved in image acquisition, correction, analysis and display, and show how digital image processing techniques can be used extend the capabilities of SIMS in the analysis of materials which are heterogeneous on the sub-micron scale.
