抄録
Three dimensional plasma simulation is presented and the results are compared with the experimental observations by Langmuir probe for an industrial inductively coupled plasma (ICP) reactor employing multi-spiral coils. In this simulation, gas heating is also taken into consideration since the gas density is inversely proportional to temperature and the effect is not negligible. It is shown that the gas temperature near the susceptor reach at 400K while the chamber is kept at 300 K when the absorbed power of the electron is at 1.5 kW. The elapsed time for one run is about only 85 minutes for Ar and it is quite acceptable as an industrial tool for various plasma processes.
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