真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
極微少電流低速電子線回折法による希ガス物理吸着層の成長過程の観察
阿部 雪子五十嵐 慎一入江 泰雄平山 孝人荒川 一郎
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1998 年 41 巻 4 号 p. 452-457

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We have developed an eXtremely-low-current Low Energy Electron Diffraction (XLEED) apparatus equipped with a micro-channel plate and a position-sensitive detector which reduces electron beam damage and charge-up effects and makes it possible to study the structure of physisorbed films. This XLEED system is combined with the ellipsometer system which monitors the thickness of a physisorbed film. We observed Xe overlayer on Ag (111) and grahpite (0001) surfaces. We found that a thick Xe films on Ag (111) showed a single crystal structure which keeps relative orientation to the substrate.

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