真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
組成傾斜構造とAr圧がZrN/Zr/ZrO2とZrN/ZrO2膜の硬さ及び付着力に与える影響
一山 正則沢平 嘉浩黒田 靖信佐藤 彰繁北河 勝菊地 直人草野 英二南戸 秀仁金原 粲
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1999 年 42 巻 3 号 p. 167-170

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Effects of compositionally gradient structure and discharge gas pressure on microhardness and adhesion of ZrN/Zr/ ZrO2/substrate and ZrN/ZrO2/substrate films have been studied. The apparatus used to deposit the films was an UHV-type sputtering machine with a Zr magnetron cathode. The compositional graduation of the films was formed by changing reactive gas flow rate gradually for a constant discharge current in the reactive sputtering. For film prepared, microhardness and adhesion strength were examined. The highest hardness was achieved for a ZrN/ZrO2 film with a gradient interlayer deposited at an Ar partial pressure of 0.4 Pa. The ZrN/ZrO2 or ZrN/Zr/ZrO2 films with interrupted interfaces showed lower microhardnesses compared to the films with gradient interfaces. Although the adhesion strength increased as Ar partial pressure increased, the microhardness decreased. Thus, it was concluded from the experimental results obtained that the ZrN/ZrO2 films with gradient interfaces deposited at a low Ar pressure yielded a high performance as a hard coating.

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