Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
巻頭言
大電力パルススパッタ小特集に寄せて
中野 武雄
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ジャーナル フリー

2017 年 60 巻 9 号 p. 339-340

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 High Power Impulse/Pulsed Magnetron Sputtering (HiPIMS/HPPMS) process has several interesting aspects and is vigorously studied in recent years. In this preface, some trends in HiPIMS research are briefly reviewed: 1) the applicability of HiPIMS to practical deposition processes, 2) the behavior of the transient and high density plasma, and 3) the application of HiPIMS to the reactive sputtering. By this, the author tried to help the readers to overview this field, and to locate the importance of the contributions to this special issue.

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© 2017 一般社団法人日本真空学会
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