Fluid Flow Model in a Vertical Multiwafer Stacked-in-Tube CVD Reactor

Application of simple fluid-flow model

Abstract

Mass transfer in a vertical multiwafer stacked-in-tube CVD reactor was analyzed by simple fluid-flow models, and the applicable range of the models was determined. Carbon plate was burnt under the condition of relatively low burning rate in the CVD reactor. The local burning rate of the carbon plate was analyzed by a one-dimensional diffusion model in the wafer part and a cell-in-series model based upon the wafer distance in the annular part or cell-in-series model in the space between the wafers. The applicable range of the simple model was specified by a dimensionless modulus,
J (=r_w√k/HD)