2012 年 78 巻 786 号 p. 615-626
In order to bring the nano processing technology using SPM (scanning probe microscope) probes from R&D stage to practical use, it is indispensable to improve its throughput drastically. One way to achieve higher throughput is fabricating an array of multiple probes and using these probes simultaneously. In this case, deviation of electric contact characteristics among probe tips may disturb the optimal processing action. In this study, the authors are focusing on the relation between the contact resistance and the contact force of nanoscale probe tips. We used an AFM (atomic force microscope) which can apply a bias voltage to a substrate holder and measured the contact resistance between an AFM probe tip coated with a conductive film and a surface of conductive substrates. The substrate surface condition should resemble the practical use. Therefore, we employed a cleaning process feasible in the actual manufacturing environment. By investigating the effects of the several factors such as the surface condition of substrates, the tip radius of probes, the authors studied the quantitative deviation and dispersion of the actual contact characteristics from the traditional contact theory.