Denki Kagaku oyobi Kogyo Butsuri Kagaku
Online ISSN : 2434-2556
Print ISSN : 0366-9297
Technological Reports
Selective Deposition of Titanium Silicide Films by Plasma-Enhanced Chemical Vapor Deposition and Related Processes for Silicide-Clad Silicon Electrode Formation
Kunio SAITO, Takao AMAZAWA, Yoshinobu ARITA
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1995 Volume 63 Issue 6 Pages 513-523

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© 1995 The Electrochemical Society of Japan
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