Characteristics of KrF-Excimer-Laser Induced Absorption in Synthetic Fused Silica: Relation Between Intensities of Induced Absorption and Internal Absorption at 200 nm

Abstract

Characteristics of KrF-excimer-laser induced absorption in synthetic fusedsilica were investigated. The intensities of induced absorption depend not only on the OH content, but also on the internal absorption at 200 nm. Excimer laser-resistive optical materials can be obtained by using a fused silica containing more than approximately 1000 ppm of OH, with an internal absorption at 200 nm of less than 0.015 cm^-1.