MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678
Electron Beam Processed Silica Glass with Multi-Property
Yoshitake NishiKazuya Oguri
Author information
JOURNALS FREE ACCESS

2004 Volume 45 Issue 6 Pages 1903-1906

Details
Abstract

This paper mainly describes that surface density changes in dangling bond and charging and impurity atom adsorption caused the multiproperties of silica glass irradiated by electron beam (EB). The irradiated silica glass with high wettability, misting free, sterilization, and high strength has been successfully obtained. Dangling bond formation and charging generally attract the poling water molecules. Thus, EB irradiation decreased the water contact angle of silica glass. Scattering of light reflection of fine sessile drops of water usually causes the misting. When the water wettability is caused by EB irradiation, the water thin film is formed. Thus, the electron beam irradiation prevents the misting. On the other hand, the strengthening, generated by EB irradiation, was mainly induced by the stress relaxation induced by dangling bond in network structure of silica glass irradiated.

Information related to the author
© 2004 The Japan Institute of Metals and Materials
Previous article Next article
feedback
Top