Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678
Influence of Substrate Bias Voltage on the Impurity Concentrations in Hf Films Deposited by Ion Beam Deposition Method
Joon Woo BaeJae-Won LimKouji MimuraMinoru Isshiki
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2006 Volume 47 Issue 2 Pages 279-282


Hf films have been deposited on Si(100) substrate with or without a substrate bias voltage using a non-mass separated ion beam deposition (IBD) method. Secondary ion mass spectrometry (SIMS) and glow discharge mass spectrometry (GDMS) have been used to determine impurity concentrations of Hf films and a Hf target. By the SIMS results with Cs+ and O2+ ion beams, the Hf film deposited at Vs=0 V contains more impurities than the Hf film deposited at Vs=−50 V. In addition, from GDMS results for the Hf target and the Hf films deposited at Vs=0 and −50 V, almost all the impurities have reduced by applying a negative substrate bias voltage. It means that applying a negative bias voltage to the substrate can decrease the impurity concentrations in Hf films.

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© 2006 The Japan Institute of Metals and Materials
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