MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678
Hydrogenation and Dehydrogenation Properties of [AlN-Pd]/Y and [AlOx-Pd]/[AlN-Pd]/Y Films
Yasuhiro YanagiharaAkira YamaguchiJun-ichi Echigoya
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2007 Volume 48 Issue 3 Pages 635-636

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Abstract

We report hydrogenation and dehydrogenation properties of the [AlN-Pd]/Y and [AlOx-Pd]/[AlN-Pd]/Y films. The [AlN-Pd] and [AlOx-Pd]/[AlN-Pd] composite cap layers were deposited on yttrium layers by a rf-magnetron sputtering method. The cap layers were used to protect the Y layers from oxidation. Electrical resistivity of the films was measured during a few cycles of hydrogen loading and unloading in order to monitor the hydrogenation and dehydrogenation of the Y layers. As repeating the cycles, the amplitude of resistivity change was gradually reduced for the [AlOx-Pd]/[AlN-Pd]/Y film. On the other hand, the [AlOx-Pd]/[AlN-Pd] protective layer showed much better stability against the high temperature steam than the [AlN-Pd] layer.

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© 2007 The Japan Institute of Metals and Materials
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