2009 Volume 50 Issue 9 Pages 2329-2334
TiO2 thin films were deposited on rutile SnO2 films by reactive radio frequency magnetron sputtering. The effect of thickness of TiO2 layer, on the microstructure and chemical states of the TiO2/SnO2 thin films, was investigated in detail. With the increase of TiO2 film thickness deposited on SnO2 film, the crystallization of TiO2 film becomes more perfect, and more Ti atoms are bonding in forms of stoichiometric TiO2. There is a thickness of TiO2 film (150 nm) deposited on SnO2 substrate that yields the best photo-induced superhydrophilicity and surface wettability.