Materials Transactions, JIM
Online ISSN : 2432-471X
Print ISSN : 0916-1821
ISSN-L : 0916-1821
Diffusion Coefficient of Hydrogen in Palladium Films Prepared by RF Sputtering
Hideki Hagi
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1990 Volume 31 Issue 11 Pages 954-958

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Abstract

Diffusion coefficients of hydrogen in the palladium films of α-phase have been measured between 278 and 323 K by an electrochemical stripping method. Palladium films were deposited on iron by RF sputtering. The values of the diffusion coefficient of hydrogen obtained for the film specimens 0.68 μm and 1.36 μm in thickness were about 2 orders of magnitude lower than those reported for the bulk specimens in the literature, and the temperature dependence of the diffusion coefficients of hydrogen was given by DH(m2⁄s)=4.16×10−9exp(−25.7(kJ/mol)⁄RT).

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