抄録
Metal thin films or materials surfaces have been playing an important roll in many practical applications such as VLSI technology. It is necessary to know both the bulk and surface properties of these materials for their practical applications. To obtain very pure metal films, ion beam technology is the most sophisticated method. Theoretically, it offers isotopically pure thin films (IPTF). The combination of a mass-analyzing process and an ultra-high vacuum environment will achieve it. Negative ion beam technology is proposed for obtaining ultra-high pure thin films.
