Measurement Technique, High-Frequency Devices
ウェハレベルの磁性薄膜における高周波磁気透磁率・磁歪定数評価法の開発
2018 年 2 巻 2 号 p. 52-55
詳細
2018 年 2 巻 2 号 p. 52-55
A small microstrip-line probe developed to measure the RF properties of magnetic materials for a wide frequency range has been successfully applied to the on-site permeability measurement of thin films on Si wafers. In this study it is applied to determine the saturation magnetostriction constants of films on Si wafers. The results suggest that on-site and simultaneous measurements of permeability and magnetostriction for films on Si wafers are possible.
