The relation between the etching of copper plate by FeCl3 solution and its redox potential was studied. The results obtained indicated that the etching potential was determined, not by the redox potential. The reasons were considered as follows.
(1) Redox potential of etching solution was affected by various factors.
(2) It was difficult that the amount of Cu2+ dissolved was presumed only by redox potential of solution.
(3) Gradients of curve on etchingtime-redoxpotential and that of curve on etchingtimeamount of Cu2+ dissolved per minute were not similar.
(4) Any factors than Ee3+/Fe2+(concentration ratio) may have influences on the etching potential of copper plate by FeCl3 solution.