応用物理
Online ISSN : 2188-2290
Print ISSN : 0369-8009
ゲッタ・イオンポンプによるCOのClean Up機構 (2)
杉田 利男川崎 弘司
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1966 年 35 巻 7 号 p. 501-506

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In a previous paper by the authors, the dissociation of carbon monoxide molecules by the Pen-ning discharge and the surface reaction of carbon monoxide and oxygen on sputtered metal films are suggested to be the principal causes of clean-up of carbon monoxide by getter ion pump. In this paper, the reaction of carbon monoxide and oxyen and the replacement of carbon dioxide by oxygen or carbon monoxide on clean films of titanium, molybdenum, nickel, and palladium are studied with a mass spectrometer and by simultaneous electrical resistance measurement. On pal-ladium film, generation of carbon dioxide as a product of carbon monoxide and oxygen dissociated from carbon monoxide by electron impact is observed. The obtained results elucidate the mecha-nism of clean-up of carbon monoxide and the generation of carbon dioxide in getter ion pump with various cathode materials.

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