固体表面分析用 Disappearance Potential Spectroscopy (DAPS) 法
1981 年 50 巻 10 号 p. 1030-1039
詳細
1981 年 50 巻 10 号 p. 1030-1039
DAPS measurements were made with a commercial cylindrical-mirror-analyzer (CMA) and low-energy-electron diffraction (LEED) optics used in Auger electron spectroscopy (AES) systems. The in-situ measurements of DAPS and AES were also performed on metal surfaces of Kovar alloy, Ti, Cr, Fe, Ba, La and U.
From the result of the direct comparison between DAPS and SXAPS (soft x-ray appearance potential spectroscopy) spectra on Cr metal surface, it can be shown thatDAPS is free from the details of the deexcitation mechanism following the excitation, but SXAPS depends on them.
The DAPS spectrum of U metal can be clearly obtained in the lower energy region (_??_100 eV) without diffraction effect, and the double peak at the O3 level is observed with the separation of 4.5 eV.
DAPS method is a more surface-sensitive technique and complementary to AES.
