応用物理
Online ISSN : 2188-2290
Print ISSN : 0369-8009
ISSN-L : 0369-8009
直流二極スパッタの制御電極による制御
麻蒔 立男細川 直吉竹谷 道生
著者情報
ジャーナル フリー

1983 年 52 巻 7 号 p. 626-630

詳細
抄録

A pair of control electrodes between which an AC control voltage can be applied is inserted into the positive column between the target and the substrate holder in order to control the target current of DC diode sputtering systems. By this means the target current can be kept constant within a deviation of ±2% for even such a large pressure change as from 2.7 to 5.3 Pa. This method has been applied to the deposition of Ta films, and electrical properties of the films were investigated. Deposition rates were found to be independent of control voltages. Although specific resistivities and temperature coefficients of resistance were slightly affected by control voltages, the effect was negligible for the applied voltages between 30 and 130 V. This method is found to be very effective for massproduction inline systems combined with a rough pressure control system.

著者関連情報
© 社団法人 応用物理学会
前の記事
feedback
Top