Abstract
We have already reported the photocatalytic decomposition of octadecyltrichlorosilane (OTS) as a self-assembled monolayer (SAM) on a silicon wafer under ambient condition at room temperature by use of the porous TiO2 micro wire which was prepared by phase separation-selective leaching process. The application of such SAM is widely studied to a fabrication of a chemical sensor where organic and/or bio molecules arrange on an appropriate substrate nowadays. In this study, the OTS on a silicon wafer was photocatalytically decomposed and machined under various conditions by use of the porous TiO2 micro wire. The effects of UV irradiation time and angle, humidity and oxygen concentration on the decomposition process of OTS were examined.