日本セラミックス協会 年会・秋季シンポジウム 講演予稿集
Annual Meeting of The Ceramic Society of Japan, 2010
セッションID: 1E23
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Apatite formation in Hanks solution on Ca2SiO4 films prepared by MOCVD
*Shekhar NathRong TuTakashi Goto
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抄録
Ca 2 </ SUB> SiO 4 </ SUB> film in a single phase was prepared by MOCVD and was immersed in Hanks Solution up to 14 d. Apatite formed on the surface of the film after 1 d of immersion. A dense apatite layer covered the film surface after 7 d. CO 3 </ SUB> 2 - </ SUP> and PO 4 </ SUB> 3 - </ SUP> stretches were identified after 1 d by FT-IR. With increasing immersion period, the concentration of Si and Ca in Hanks solution slightly increased, whereas that of P decreased, implying the dissolution activity of Ca 2 </ SUB > SiO 4 </ SUB> film. The dissolution rate of Ca2SiO4 film was much lower in Hanks solution than that in distilled water.
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© The Ceramic Society of Japan 2010
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