Fuzz Growth Process under He-W Co-Deposition Conditions

抄録

Helium (He)-Tungsten (W) co-deposition experiments were conducted in the linear plasma device Co-NAGDIS at a temperature of 1223 K to observe the characteristics of fuzz growth on the W surface with auxiliary W deposition. The dependence on the deposition rate of W was investigated and a clear difference in fuzz thickness was found between He-only and co-deposition experiments. In addition, the fuzz structures on a single sample exhibited a spatially nonuniform distribution, which was probably caused by the nonuniformity in the deposition rate.