Optical Emission Signatures of Dual Planar Magnetron Plasmas for TiO₂ Deposition

抄録

The dual planar magnetron (DPM) configuration features a mirror reactive magnetron sputtering system unlike that of a single planar unbalanced magnetron set-up. Optical emission signatures of a mixed species of oxygen and argon plasmas show a decrease in intensity peaks when only a single plane is biased. This manifests an oxide layer formation on the target for the single planar case thereby lowering the sputtering yield of the titanium target. No changes in emission intensity peaks are observed when the dual planes are biased. This is favorable for increasing the yield of sputtered titanium beneficial for raising the deposition rate of TiO₂ thin film. The DPM process exhibits the anatase and rutile phases of the synthesized TiO₂ films. The films are characterized by XRD, FE-SEM, reflectance and FTIR spectroscopy. Photo-reactive properties of the materials are also presented.