Development of Photosensitive Surface Modifying Agents Containing 2-Nitrobenzyl Group for Printed Electronics

Abstract

Photosensitive surface modifier of silane coupling agents bearing carboxylic acid and amine protected by 2-nitrobenzyl group at the terminal was developed. Self-assembled monolayers were fabricated using these modifiers on the surface of silicon wafer and glass substrates followed by near UV irradiation with photomask to successfully obtain a patterning with a line width of 10 μm. The patterning was confirmed by staining with silver nanoparticulate and fluorescence agent. Development of photosensitive phosphonic acid derivatives as a novel surface modifying agent is also reported.