Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Mechanical Properties of Poly-methyl methacrylate (PMMA) for Nano Imprint Lithography
Yoshihiko HiraiTakashi YoshikawaNobuyuki TakagiSatoshi YoshidaKazuhiro Yamamoto
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Volume 16 (2003) Issue 4 Pages 615-620

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Abstract

Mechanical property of a polymer over glass transition temperature is an important factor to design process conditions in nano imprint lithography or nano embossing technology. Mechanical properties such as shear modulus, retardation time and viscosity are experimentally evaluated for poly methyl methacrylate (PMMA) for various molecular weights (12 k to 996 k) over 100°C. Also, dependency on the shearing strain rate is evaluated using WLF law. Based on the results, process conditions are discussed for nano imprint lithography and experimentally demonstrated high aspect ratio pattern.

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© 2003 The Society of Photopolymer Science and Technology (SPST)
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