Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Adhesion Mechanism of Micro Bubbles on ArF and F2 Excimer Resists
Hotaka Endo, Akira Kawai
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Keywords: micro bubble, ArF excimer resist, F2 excimer resist, adhesion, surface energy, pattern defect
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Volume 17 (2004) Issue 5 Pages 713-714

DOI https://doi.org/10.2494/photopolymer.17.713
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© 2004 The Society of Photopolymer Science and Technology (SPST)
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